Ultralow-threshold Yb3+: SiO2 glass laser fabricated by the solgel process

Eric P. Ostby; Lan Yang; Kerry J. Vahala

doi:10.1364/OL.32.002650

Ultralow-threshold Yb³⁺: SiO₂ glass laser fabricated by the solgel process

Eric P. Ostby, Lan Yang, Kerry J. Vahala

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Abstract

A Yb-doped silica microcavity laser on a silicon chip is fabricated from a solgel thin film. The high-Q microtoroid cavity, which has a finesse of 10,000, is evanescently coupled to an optical fiber taper. We report a threshold of 1.8 μW absorbed power that is, to the best of our knowledge, the lowest published threshold to date for any Yb-doped laser. The effect of Yb³⁺ concentration on laser threshold is experimentally quantified.

Original language	English
Pages (from-to)	2650-2652
Number of pages	3
Journal	Optics Letters
Volume	32
Issue number	18
DOIs	https://doi.org/10.1364/OL.32.002650
State	Published - Sep 15 2007

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abstract = "A Yb-doped silica microcavity laser on a silicon chip is fabricated from a solgel thin film. The high-Q microtoroid cavity, which has a finesse of 10,000, is evanescently coupled to an optical fiber taper. We report a threshold of 1.8 μW absorbed power that is, to the best of our knowledge, the lowest published threshold to date for any Yb-doped laser. The effect of Yb3+ concentration on laser threshold is experimentally quantified.",

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Ultralow-threshold Yb³⁺: SiO₂ glass laser fabricated by the solgel process

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