Stabilizing Cu2S for photovoltaics one atomic layer at a time

  • Shannon C. Riha
  • , Shengye Jin
  • , Sergey V. Baryshev
  • , Elijah Thimsen
  • , Gary P. Wiederrecht
  • , Alex B.F. Martinson

Research output: Contribution to journalArticlepeer-review

Abstract

Stabilizing Cu2S in its ideal stoichiometric form, chalcocite, is a long-standing challenge that must be met prior to its practical use in thin-film photovoltaic (PV) devices. Significant copper deficiency, which results in degenerate p-type doping, might be avoided by limiting Cu diffusion into a readily formed surface oxide and other adjacent layers. Here, we examine the extent to which PV-relevant metal-oxide over- and underlayers may stabilize Cu2S thin films with desirable semiconducting properties. After only 15 nm of TiO2 coating, Hall measurements and UV-vis-NIR spectroscopy reveal a significant suppression of free charge-carrier addition that depends strongly on the choice of deposition chemistry. Remarkably, the insertion of a single atomic layer of Al2O3 between Cu2S and TiO2 further stabilizes the active layer for at least 2 weeks, even under ambient conditions. The mechanism of this remarkable enhancement is explored by in situ microbalance and conductivity measurements. Finally, photoluminescence quenching measurements point to the potential utility of these nanolaminate stacks in solar-energy harvesting applications.

Original languageEnglish
Pages (from-to)10302-10309
Number of pages8
JournalACS Applied Materials and Interfaces
Volume5
Issue number20
DOIs
StatePublished - Oct 23 2013

Keywords

  • atomic-layer deposition
  • barrier layers
  • copper sulfide
  • photovoltaic
  • surface passivation
  • thin-film solar cell

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