Quantum entanglement for optical lithography and microscopy beyond the Rayleigh limit

S. J. Bentley, R. W. Boyd, E. M. Nagasako, G. S. Agarwal

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

Summary form only given. Recently, Boto et al. (see Phys. Rev. Lett., vol. 85, p. 2773, 2000) showed that using N entangled photons and an N-photon responsive lithographic recording medium, one could potentially write lithographic gratings with a resolution that is N times better than the classical Rayleigh criterion. An anticipated experimental difficulty is that such beams are weak, yet strong fields are needed to excite the N-photon absorption process. For the case of N=2, which was described in detail by Boto et al., we propose a method to overcome this problem. We also propose to use this idea "in reverse" to perform microscopy with better resolution than aloowed by the Rayleigh limit.

Original languageEnglish
Title of host publicationTechnical Digest - Summaries of Papers Presented at the Quantum Electronics and Laser Science Conference, QELS 2001
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages68-69
Number of pages2
ISBN (Electronic)155752663X, 9781557526632
DOIs
StatePublished - Jan 1 2001
EventQuantum Electronics and Laser Science Conference, QELS 2001 - Baltimore, United States
Duration: May 6 2001May 11 2001

Publication series

NameTechnical Digest - Summaries of Papers Presented at the Quantum Electronics and Laser Science Conference, QELS 2001

Conference

ConferenceQuantum Electronics and Laser Science Conference, QELS 2001
CountryUnited States
CityBaltimore
Period05/6/0105/11/01

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