TY - JOUR
T1 - Negative thermal expansion in ultrathin plasma polymerized films
AU - Singamaneni, Srikanth
AU - LeMieux, Melburne C.
AU - Jiang, Hao
AU - Bunning, Timothy J.
AU - Tsukruk, Vladimir V.
PY - 2007/1/23
Y1 - 2007/1/23
N2 - The unusual thermal behavior of ultrathin plasma polymerized polymer films on silicon wafers were investigated. The polymer films were deposited by the PECVD technique in a custom built PECVD reactor and characterized by FTIR, AFM, and XPS. Thermal expansion of the polymer films was studied by measuring the thickness of the films in the course of heating and cooling using ellipsometry, and the thickness value was confirmed by AFM. The plasma-polymerized polymers exhibited an important nonlinear variation of thickness with temperature when cooled. Thermal contraction of the polymer films was observed during heating, as well as negative thermal expansion was found to be reversible.
AB - The unusual thermal behavior of ultrathin plasma polymerized polymer films on silicon wafers were investigated. The polymer films were deposited by the PECVD technique in a custom built PECVD reactor and characterized by FTIR, AFM, and XPS. Thermal expansion of the polymer films was studied by measuring the thickness of the films in the course of heating and cooling using ellipsometry, and the thickness value was confirmed by AFM. The plasma-polymerized polymers exhibited an important nonlinear variation of thickness with temperature when cooled. Thermal contraction of the polymer films was observed during heating, as well as negative thermal expansion was found to be reversible.
UR - http://www.scopus.com/inward/record.url?scp=33846886944&partnerID=8YFLogxK
U2 - 10.1021/cm0622093
DO - 10.1021/cm0622093
M3 - Article
AN - SCOPUS:33846886944
SN - 0897-4756
VL - 19
SP - 129
EP - 131
JO - Chemistry of Materials
JF - Chemistry of Materials
IS - 2
ER -