Microfabrication of WO3-based microelectrochemical devices

Martin O. Schloh; Nicholas Leventis; Mark S. Wrighton

doi:10.1063/1.343474

Microfabrication of WO₃-based microelectrochemical devices

Martin O. Schloh
, Nicholas Leventis
, Mark S. Wrighton

Department of Chemistry

Research output: Contribution to journal › Article › peer-review

17 Scopus citations

Abstract

A new photolithographic process for the patterning of WO₃ is reported. A layer of sputtered polycrystalline WO₃ can be patterned by a combination of photolithographic and dry etching processes to selectively cover a fraction of eight Pt microelectrodes each ∼50 μm long, 2 μm wide, and 0.3 μm thick, and spaced 1.2 μm apart. The modified microelectrode arrays were characterized by electrochemistry, surface profilometry, and scanning electron microscopy. A pair of microelectrodes connected by WO₃ comprises a microelectrochemical transistor with pH-dependent electrical characteristics based on the pH and potential dependent conductivity of WO₃ associated with the reversible electrochemical reaction WO₃+nH⁺+ne^-⇄H _nWO₃.

Original language	English
Pages (from-to)	965-968
Number of pages	4
Journal	Journal of Applied Physics
Volume	66
Issue number	2
DOIs	https://doi.org/10.1063/1.343474
State	Published - 1989

Access to Document

10.1063/1.343474

Cite this

@article{c25e0155c7404ba88b6c1a1fd46f0557,

title = "Microfabrication of WO3-based microelectrochemical devices",

abstract = "A new photolithographic process for the patterning of WO3 is reported. A layer of sputtered polycrystalline WO3 can be patterned by a combination of photolithographic and dry etching processes to selectively cover a fraction of eight Pt microelectrodes each ∼50 μm long, 2 μm wide, and 0.3 μm thick, and spaced 1.2 μm apart. The modified microelectrode arrays were characterized by electrochemistry, surface profilometry, and scanning electron microscopy. A pair of microelectrodes connected by WO3 comprises a microelectrochemical transistor with pH-dependent electrical characteristics based on the pH and potential dependent conductivity of WO3 associated with the reversible electrochemical reaction WO3+nH++ne-⇄H nWO3.",

author = "Schloh, \{Martin O.\} and Nicholas Leventis and Wrighton, \{Mark S.\}",

year = "1989",

doi = "10.1063/1.343474",

language = "English",

volume = "66",

pages = "965--968",

journal = "Journal of Applied Physics",

issn = "0021-8979",

number = "2",

}

TY - JOUR

T1 - Microfabrication of WO3-based microelectrochemical devices

AU - Schloh, Martin O.

AU - Leventis, Nicholas

AU - Wrighton, Mark S.

PY - 1989

Y1 - 1989

N2 - A new photolithographic process for the patterning of WO3 is reported. A layer of sputtered polycrystalline WO3 can be patterned by a combination of photolithographic and dry etching processes to selectively cover a fraction of eight Pt microelectrodes each ∼50 μm long, 2 μm wide, and 0.3 μm thick, and spaced 1.2 μm apart. The modified microelectrode arrays were characterized by electrochemistry, surface profilometry, and scanning electron microscopy. A pair of microelectrodes connected by WO3 comprises a microelectrochemical transistor with pH-dependent electrical characteristics based on the pH and potential dependent conductivity of WO3 associated with the reversible electrochemical reaction WO3+nH++ne-⇄H nWO3.

AB - A new photolithographic process for the patterning of WO3 is reported. A layer of sputtered polycrystalline WO3 can be patterned by a combination of photolithographic and dry etching processes to selectively cover a fraction of eight Pt microelectrodes each ∼50 μm long, 2 μm wide, and 0.3 μm thick, and spaced 1.2 μm apart. The modified microelectrode arrays were characterized by electrochemistry, surface profilometry, and scanning electron microscopy. A pair of microelectrodes connected by WO3 comprises a microelectrochemical transistor with pH-dependent electrical characteristics based on the pH and potential dependent conductivity of WO3 associated with the reversible electrochemical reaction WO3+nH++ne-⇄H nWO3.

UR - https://www.scopus.com/pages/publications/0000258111

U2 - 10.1063/1.343474

DO - 10.1063/1.343474

M3 - Article

AN - SCOPUS:0000258111

SN - 0021-8979

VL - 66

SP - 965

EP - 968

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 2

ER -

Microfabrication of WO₃-based microelectrochemical devices

Abstract

Access to Document

Other files and links

Fingerprint

Cite this