Low-temperature atomic layer-deposited TiO 2 films with low photoactivity

Xinhua Liang; David M. King; Peng Li; Alan W. Weimer

doi:10.1111/j.1551-2916.2009.02940.x

Low-temperature atomic layer-deposited TiO ₂ films with low photoactivity

Xinhua Liang
, David M. King
, Peng Li
, Alan W. Weimer

Department of Energy, Environmental & Chemical Engineering

Research output: Contribution to journal › Article › peer-review

34 Scopus citations

Abstract

Atomic layer deposition (ALD) has been successfully utilized for the conformal and uniform deposition of ultrathin titanium dioxide (TiO ₂) films on high-density polyethylene (HDPE) particles. The deposition was carried out by alternating reactions of titanium tetraisopropoxide and H ₂O ₂ (50 wt% in H ₂O) at 77°C in a fluidized bed reactor. X-ray photoelectron spectroscopy confirmed the deposition of TiO ₂ and scanning transmission electron microscopy showed the conformal TiO ₂ films deposited on polymer particle surfaces. The TiO ₂ ALD process yielded a growth rate of 0.15 nm/cycle at 77°C. The results of inductively coupled plasma atomic emission spectroscopy suggested that there was a nucleation period, which showed the reaction mechanism of TiO ₂ ALD on HDPE particles without chemical functional groups. TiO ₂ ALD films deposited at such a low temperature had an amorphous structure and showed a much weaker photoactivity intensity than common pigment-grade anatase TiO ₂ particles.

Original language	English
Pages (from-to)	649-654
Number of pages	6
Journal	Journal of the American Ceramic Society
Volume	92
Issue number	3
DOIs	https://doi.org/10.1111/j.1551-2916.2009.02940.x
State	Published - Mar 2009

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title = "Low-temperature atomic layer-deposited TiO 2 films with low photoactivity",

abstract = "Atomic layer deposition (ALD) has been successfully utilized for the conformal and uniform deposition of ultrathin titanium dioxide (TiO 2) films on high-density polyethylene (HDPE) particles. The deposition was carried out by alternating reactions of titanium tetraisopropoxide and H 2O 2 (50 wt\% in H 2O) at 77°C in a fluidized bed reactor. X-ray photoelectron spectroscopy confirmed the deposition of TiO 2 and scanning transmission electron microscopy showed the conformal TiO 2 films deposited on polymer particle surfaces. The TiO 2 ALD process yielded a growth rate of 0.15 nm/cycle at 77°C. The results of inductively coupled plasma atomic emission spectroscopy suggested that there was a nucleation period, which showed the reaction mechanism of TiO 2 ALD on HDPE particles without chemical functional groups. TiO 2 ALD films deposited at such a low temperature had an amorphous structure and showed a much weaker photoactivity intensity than common pigment-grade anatase TiO 2 particles.",

author = "Xinhua Liang and King, \{David M.\} and Peng Li and Weimer, \{Alan W.\}",

year = "2009",

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doi = "10.1111/j.1551-2916.2009.02940.x",

language = "English",

volume = "92",

pages = "649--654",

journal = "Journal of the American Ceramic Society",

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T1 - Low-temperature atomic layer-deposited TiO 2 films with low photoactivity

AU - Liang, Xinhua

AU - King, David M.

AU - Li, Peng

AU - Weimer, Alan W.

PY - 2009/3

Y1 - 2009/3

N2 - Atomic layer deposition (ALD) has been successfully utilized for the conformal and uniform deposition of ultrathin titanium dioxide (TiO 2) films on high-density polyethylene (HDPE) particles. The deposition was carried out by alternating reactions of titanium tetraisopropoxide and H 2O 2 (50 wt% in H 2O) at 77°C in a fluidized bed reactor. X-ray photoelectron spectroscopy confirmed the deposition of TiO 2 and scanning transmission electron microscopy showed the conformal TiO 2 films deposited on polymer particle surfaces. The TiO 2 ALD process yielded a growth rate of 0.15 nm/cycle at 77°C. The results of inductively coupled plasma atomic emission spectroscopy suggested that there was a nucleation period, which showed the reaction mechanism of TiO 2 ALD on HDPE particles without chemical functional groups. TiO 2 ALD films deposited at such a low temperature had an amorphous structure and showed a much weaker photoactivity intensity than common pigment-grade anatase TiO 2 particles.

AB - Atomic layer deposition (ALD) has been successfully utilized for the conformal and uniform deposition of ultrathin titanium dioxide (TiO 2) films on high-density polyethylene (HDPE) particles. The deposition was carried out by alternating reactions of titanium tetraisopropoxide and H 2O 2 (50 wt% in H 2O) at 77°C in a fluidized bed reactor. X-ray photoelectron spectroscopy confirmed the deposition of TiO 2 and scanning transmission electron microscopy showed the conformal TiO 2 films deposited on polymer particle surfaces. The TiO 2 ALD process yielded a growth rate of 0.15 nm/cycle at 77°C. The results of inductively coupled plasma atomic emission spectroscopy suggested that there was a nucleation period, which showed the reaction mechanism of TiO 2 ALD on HDPE particles without chemical functional groups. TiO 2 ALD films deposited at such a low temperature had an amorphous structure and showed a much weaker photoactivity intensity than common pigment-grade anatase TiO 2 particles.

UR - https://www.scopus.com/pages/publications/62549085999

U2 - 10.1111/j.1551-2916.2009.02940.x

DO - 10.1111/j.1551-2916.2009.02940.x

M3 - Article

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SN - 0002-7820

VL - 92

SP - 649

EP - 654

JO - Journal of the American Ceramic Society

JF - Journal of the American Ceramic Society

IS - 3

ER -

Low-temperature atomic layer-deposited TiO ₂ films with low photoactivity

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