Ion beam sputtering apparatus for fabrication of compositionally modulated materials

F. Spaepen; A. L. Greer; K. F. Kelton; J. L. Bell

doi:10.1063/1.1138511

Ion beam sputtering apparatus for fabrication of compositionally modulated materials

F. Spaepen
, A. L. Greer
, K. F. Kelton
, J. L. Bell

Department of Physics

Research output: Contribution to journal › Article › peer-review

23 Scopus citations

Abstract

A new apparatus for production of artificial compositionally modulated materials is presented. It consists of an ion gun that sputters from alternating targets on a rotating assembly, the position of which is controlled by a thickness monitoring crystal. The apparatus is simple, relatively inexpensive, and flexible, in that it allows deposition of metals, semiconductors, and insulators under the same conditions.

Original language	English
Pages (from-to)	1340-1343
Number of pages	4
Journal	Review of Scientific Instruments
Volume	56
Issue number	7
DOIs	https://doi.org/10.1063/1.1138511
State	Published - 1985

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title = "Ion beam sputtering apparatus for fabrication of compositionally modulated materials",

abstract = "A new apparatus for production of artificial compositionally modulated materials is presented. It consists of an ion gun that sputters from alternating targets on a rotating assembly, the position of which is controlled by a thickness monitoring crystal. The apparatus is simple, relatively inexpensive, and flexible, in that it allows deposition of metals, semiconductors, and insulators under the same conditions.",

author = "F. Spaepen and Greer, \{A. L.\} and Kelton, \{K. F.\} and Bell, \{J. L.\}",

year = "1985",

doi = "10.1063/1.1138511",

language = "English",

volume = "56",

pages = "1340--1343",

journal = "Review of Scientific Instruments",

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T1 - Ion beam sputtering apparatus for fabrication of compositionally modulated materials

AU - Spaepen, F.

AU - Greer, A. L.

AU - Kelton, K. F.

AU - Bell, J. L.

PY - 1985

Y1 - 1985

N2 - A new apparatus for production of artificial compositionally modulated materials is presented. It consists of an ion gun that sputters from alternating targets on a rotating assembly, the position of which is controlled by a thickness monitoring crystal. The apparatus is simple, relatively inexpensive, and flexible, in that it allows deposition of metals, semiconductors, and insulators under the same conditions.

AB - A new apparatus for production of artificial compositionally modulated materials is presented. It consists of an ion gun that sputters from alternating targets on a rotating assembly, the position of which is controlled by a thickness monitoring crystal. The apparatus is simple, relatively inexpensive, and flexible, in that it allows deposition of metals, semiconductors, and insulators under the same conditions.

UR - https://www.scopus.com/pages/publications/36549101027

U2 - 10.1063/1.1138511

DO - 10.1063/1.1138511

M3 - Article

AN - SCOPUS:36549101027

SN - 0034-6748

VL - 56

SP - 1340

EP - 1343

JO - Review of Scientific Instruments

JF - Review of Scientific Instruments

IS - 7

ER -

Ion beam sputtering apparatus for fabrication of compositionally modulated materials

Abstract

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