TY - JOUR
T1 - Highly tunable, polarization-engineered two-dimensional electron gas in ϵ-AlGaO3/ϵ-Ga2O3 heterostructures
AU - Ranga, Praneeth
AU - Cho, Sung Beom
AU - Mishra, Rohan
AU - Krishnamoorthy, Sriram
N1 - Publisher Copyright:
© 2020 The Japan Society of Applied Physics.
PY - 2020/6/1
Y1 - 2020/6/1
N2 - We report on the modeling of polarization-induced two-dimensional electron gas (2DEG) formation at ϵ-AlGaO3/ϵ-Ga2O3 heterointerface and the effect of spontaneous polarization (P sp) reversal on 2DEG density in ϵ-Ga2O3/ϵ-AlGaO3/ϵ-Ga2O3 double heterostructures. Density-functional theory (DFT) is utilized to calculate the material properties of ϵ-Ga2O3 and ϵ-AlGaO3 alloys. Using Schrödinger-Poisson solver along with DFT calculated parameters, the 2DEG density is calculated as a function of barrier type and thickness. By optimizing the layer thicknesses of ϵ-Ga2O3/ϵ-AlGaO3/ϵ-Ga2O3 heterostructures, charge contrast ratios exceeding 1600 are obtained. This computational study indicates the high potential for ϵ-Ga2O3-based heterostructure devices for non-volatile memories and neuromorphic applications.
AB - We report on the modeling of polarization-induced two-dimensional electron gas (2DEG) formation at ϵ-AlGaO3/ϵ-Ga2O3 heterointerface and the effect of spontaneous polarization (P sp) reversal on 2DEG density in ϵ-Ga2O3/ϵ-AlGaO3/ϵ-Ga2O3 double heterostructures. Density-functional theory (DFT) is utilized to calculate the material properties of ϵ-Ga2O3 and ϵ-AlGaO3 alloys. Using Schrödinger-Poisson solver along with DFT calculated parameters, the 2DEG density is calculated as a function of barrier type and thickness. By optimizing the layer thicknesses of ϵ-Ga2O3/ϵ-AlGaO3/ϵ-Ga2O3 heterostructures, charge contrast ratios exceeding 1600 are obtained. This computational study indicates the high potential for ϵ-Ga2O3-based heterostructure devices for non-volatile memories and neuromorphic applications.
UR - https://www.scopus.com/pages/publications/85085645275
U2 - 10.35848/1882-0786/ab9168
DO - 10.35848/1882-0786/ab9168
M3 - Article
AN - SCOPUS:85085645275
SN - 1882-0778
VL - 13
JO - Applied Physics Express
JF - Applied Physics Express
IS - 6
M1 - 061009
ER -