TY - JOUR
T1 - Erbium-implanted high-Q silica toroidal microcavity laser on a silicon chip
AU - Min, Bumki
AU - Kippenberg, Tobias J.
AU - Yang, Lan
AU - Vahala, Kerry J.
AU - Kalkman, Jeroen
AU - Polman, Albert
N1 - Funding Information:
This work was supported by the Defense Advanced Research Project Agency, the National Science Foundation, and the Caltech Lee Center. The Dutch part of this work was part of the research program of the Foundation for Fundamental Research on Matter (FOM) and was financially supported by the Dutch Organization for Fundamental Research on Matter.
PY - 2004/9
Y1 - 2004/9
N2 - Lasing from an erbium-doped high-Q silica toroidal microcavity coupled to a optical fiber was investigated. Average erbium ion concentrations in the range 0.009-0.09 at.%, and a threshold power as low as 4.5 μW and an output lasing power as high as 39.4 μW were obtained. It was found that controlling lasing wavelength in a discrete way at each whispering-gallery mode was possible by changing the cavity loading. Analytic formulas predicting threshold power and differential slope efficiency were derived.
AB - Lasing from an erbium-doped high-Q silica toroidal microcavity coupled to a optical fiber was investigated. Average erbium ion concentrations in the range 0.009-0.09 at.%, and a threshold power as low as 4.5 μW and an output lasing power as high as 39.4 μW were obtained. It was found that controlling lasing wavelength in a discrete way at each whispering-gallery mode was possible by changing the cavity loading. Analytic formulas predicting threshold power and differential slope efficiency were derived.
UR - http://www.scopus.com/inward/record.url?scp=19644401073&partnerID=8YFLogxK
U2 - 10.1103/PhysRevA.70.033803
DO - 10.1103/PhysRevA.70.033803
M3 - Article
AN - SCOPUS:19644401073
SN - 1050-2947
VL - 70
SP - 033803-1-033803-12
JO - Physical Review A - Atomic, Molecular, and Optical Physics
JF - Physical Review A - Atomic, Molecular, and Optical Physics
IS - 3
M1 - 033803
ER -