TY - JOUR
T1 - Carrier plasmon induced nonlinear band gap renormalization in two-dimensional semiconductors
AU - Liang, Yufeng
AU - Yang, Li
N1 - Publisher Copyright:
© 2015 American Physical Society.
PY - 2015/2/10
Y1 - 2015/2/10
N2 - In reduced-dimensional semiconductors, doping-induced carrier plasmons can strongly couple with quasiparticle excitations, leading to a significant band gap renormalization. However, the physical origin of this generic effect remains obscure. We develop a new plasmon-pole theory that efficiently and accurately captures this coupling. Using monolayer MoS2 and MoSe2 as prototype two-dimensional (2D) semiconductors, we reveal a striking band gap renormalization above 400 meV and an unusual nonlinear evolution of their band gaps with doping. This prediction significantly differs from the linear behavior that is observed in one-dimensional structures. Notably, our predicted band gap renormalization for MoSe2 is in excellent agreement with recent experimental results. Our developed approach allows for a quantitative understanding of many-body interactions in general doped 2D semiconductors and paves the way for novel band gap engineering techniques.
AB - In reduced-dimensional semiconductors, doping-induced carrier plasmons can strongly couple with quasiparticle excitations, leading to a significant band gap renormalization. However, the physical origin of this generic effect remains obscure. We develop a new plasmon-pole theory that efficiently and accurately captures this coupling. Using monolayer MoS2 and MoSe2 as prototype two-dimensional (2D) semiconductors, we reveal a striking band gap renormalization above 400 meV and an unusual nonlinear evolution of their band gaps with doping. This prediction significantly differs from the linear behavior that is observed in one-dimensional structures. Notably, our predicted band gap renormalization for MoSe2 is in excellent agreement with recent experimental results. Our developed approach allows for a quantitative understanding of many-body interactions in general doped 2D semiconductors and paves the way for novel band gap engineering techniques.
UR - https://www.scopus.com/pages/publications/84922761636
U2 - 10.1103/PhysRevLett.114.063001
DO - 10.1103/PhysRevLett.114.063001
M3 - Article
AN - SCOPUS:84922761636
SN - 0031-9007
VL - 114
JO - Physical Review Letters
JF - Physical Review Letters
IS - 6
M1 - 063001
ER -