Atomic layer deposition of iron(III) oxide on zirconia nanoparticles in a fluidized bed reactor using ferrocene and oxygen

  • Jonathan R. Scheffe
  • , Andrea Francés
  • , David M. King
  • , Xinhua Liang
  • , Brittany A. Branch
  • , Andrew S. Cavanagh
  • , Steven M. George
  • , Alan W. Weimer

Research output: Contribution to journalArticlepeer-review

Abstract

Conformal films of amorphous iron(III) oxide and α-Fe2O3 have been coated on zirconia nanoparticles (26 nm) in a fluidized bed reactor by atomic layer deposition. Ferrocene and oxygen were alternately dosed into the reactor at temperatures between 367 °C and 534 °C. Self-limiting chemistry was observed via in situ mass spectrometry, and by means of induced coupled plasma-atomic emission spectroscopy analysis. Film conformality and uniformity were verified by high resolution transmission electron microscopy, and the growth rate was determined to be 0.15 Å per cycle. Energy dispersive spectroscopy, X-ray diffractometry, and X-ray photoelectron spectroscopy were utilized as a means to determine film composition at each deposition temperature. Over all of the deposition temperatures investigated, films were deposited as amorphous iron(III) oxide. However, after heat treatment at 850 °C in air and N2 atmospheres, α-Fe2O3 was the predominant species.

Original languageEnglish
Pages (from-to)1874-1879
Number of pages6
JournalThin Solid Films
Volume517
Issue number6
DOIs
StatePublished - Jan 30 2009

Keywords

  • Atomic layer deposition (ALD)
  • Ferrocene
  • Iron oxide
  • Nanoparticles
  • Thin film

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