Alumina atomic layer deposition nanocoatings on primary diamond particles using a fluidized bed reactor

Xinhua Liang; Guo Dong Zhan; David M. King; Jarod A. McCormick; John Zhang; Steven M. George; Alan W. Weimer

doi:10.1016/j.diamond.2007.12.003

Alumina atomic layer deposition nanocoatings on primary diamond particles using a fluidized bed reactor

Xinhua Liang
, Guo Dong Zhan
, David M. King
, Jarod A. McCormick
, John Zhang
, Steven M. George
, Alan W. Weimer

Department of Energy, Environmental & Chemical Engineering

Research output: Contribution to journal › Article › peer-review

43 Scopus citations

Abstract

Ultra-thin alumina films are successfully deposited on primary micron-sized diamond particles in a scalable fluidized bed reactor. The studies of fluidization at reduced pressure show that micron-sized diamond particles can be fluidized with the assistance of vibration. Alumina films are grown at 177 °C by atomic layer deposition (ALD) using sequential exposures of Al(CH₃)₃ and H₂O. The deposited alumina films are characterized by X-ray photoelectron spectroscopy, transmission and scanning electron microscopy, inductively coupled plasma-atomic emission spectroscopy, and surface area. The results indicate that the alumina films are conformally coated on the primary diamond particle surface, and the growth rate of alumina is 0.12 nm per coating cycle.

Original language	English
Pages (from-to)	185-189
Number of pages	5
Journal	Diamond and Related Materials
Volume	17
Issue number	2
DOIs	https://doi.org/10.1016/j.diamond.2007.12.003
State	Published - Feb 2008

Keywords

Alumina film
Atomic layer deposition (ALD)
Fluidized bed reactor

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10.1016/j.diamond.2007.12.003

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title = "Alumina atomic layer deposition nanocoatings on primary diamond particles using a fluidized bed reactor",

abstract = "Ultra-thin alumina films are successfully deposited on primary micron-sized diamond particles in a scalable fluidized bed reactor. The studies of fluidization at reduced pressure show that micron-sized diamond particles can be fluidized with the assistance of vibration. Alumina films are grown at 177 °C by atomic layer deposition (ALD) using sequential exposures of Al(CH3)3 and H2O. The deposited alumina films are characterized by X-ray photoelectron spectroscopy, transmission and scanning electron microscopy, inductively coupled plasma-atomic emission spectroscopy, and surface area. The results indicate that the alumina films are conformally coated on the primary diamond particle surface, and the growth rate of alumina is 0.12 nm per coating cycle.",

keywords = "Alumina film, Atomic layer deposition (ALD), Fluidized bed reactor",

author = "Xinhua Liang and Zhan, \{Guo Dong\} and King, \{David M.\} and McCormick, \{Jarod A.\} and John Zhang and George, \{Steven M.\} and Weimer, \{Alan W.\}",

year = "2008",

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doi = "10.1016/j.diamond.2007.12.003",

language = "English",

volume = "17",

pages = "185--189",

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TY - JOUR

T1 - Alumina atomic layer deposition nanocoatings on primary diamond particles using a fluidized bed reactor

AU - Liang, Xinhua

AU - Zhan, Guo Dong

AU - King, David M.

AU - McCormick, Jarod A.

AU - Zhang, John

AU - George, Steven M.

AU - Weimer, Alan W.

PY - 2008/2

Y1 - 2008/2

N2 - Ultra-thin alumina films are successfully deposited on primary micron-sized diamond particles in a scalable fluidized bed reactor. The studies of fluidization at reduced pressure show that micron-sized diamond particles can be fluidized with the assistance of vibration. Alumina films are grown at 177 °C by atomic layer deposition (ALD) using sequential exposures of Al(CH3)3 and H2O. The deposited alumina films are characterized by X-ray photoelectron spectroscopy, transmission and scanning electron microscopy, inductively coupled plasma-atomic emission spectroscopy, and surface area. The results indicate that the alumina films are conformally coated on the primary diamond particle surface, and the growth rate of alumina is 0.12 nm per coating cycle.

AB - Ultra-thin alumina films are successfully deposited on primary micron-sized diamond particles in a scalable fluidized bed reactor. The studies of fluidization at reduced pressure show that micron-sized diamond particles can be fluidized with the assistance of vibration. Alumina films are grown at 177 °C by atomic layer deposition (ALD) using sequential exposures of Al(CH3)3 and H2O. The deposited alumina films are characterized by X-ray photoelectron spectroscopy, transmission and scanning electron microscopy, inductively coupled plasma-atomic emission spectroscopy, and surface area. The results indicate that the alumina films are conformally coated on the primary diamond particle surface, and the growth rate of alumina is 0.12 nm per coating cycle.

KW - Alumina film

KW - Atomic layer deposition (ALD)

KW - Fluidized bed reactor

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U2 - 10.1016/j.diamond.2007.12.003

DO - 10.1016/j.diamond.2007.12.003

M3 - Article

AN - SCOPUS:38149127147

SN - 0925-9635

VL - 17

SP - 185

EP - 189

JO - Diamond and Related Materials

JF - Diamond and Related Materials

IS - 2

ER -

Alumina atomic layer deposition nanocoatings on primary diamond particles using a fluidized bed reactor

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Keywords

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