Abstract
Patterning of the secondary structure of silk films is achieved on the micrometer scale using a soft lithographic technique, as illustrated in the figure. The alternating areas of silk I and silk Il structure have different mechanical, surface, and solubility properties but nominally the same | chemical composition. This technique will enable the development of other tailored protein materials with selectively transformed localized secondary structure.
Original language | English |
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Pages (from-to) | 115-119 |
Number of pages | 5 |
Journal | Advanced Materials |
Volume | 22 |
Issue number | 1 |
DOIs | |
State | Published - Jan 5 2010 |